Dossier

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS

InventionPending

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Dossier Overview

Applicant

Shin-Etsu Chemical Co., Ltd.

Inventor

Kobayashi, Naoki; Kori, Daisuke; Yano, Toshiharu

Filing Date

Jun 24, 2025

Publication Date

Jan 6, 2026

IPC Classification

G03FC08F

CPC Classification

G03FG03FC08F

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