METHOD OF STORING HIGH PURITY ALKYL TIN COMPOUNDS
개요
출원인
Gelest, Inc.; Mitsubishi Chemical Corporation
발명자
Li YANG; Yuta HIOKI
IPC 분류
CPC 분류
Monoalkyl tin triamide compounds having purity of at least about 99 mol % and the chemical formula RSn(NMe)are described. Ris selected from R, Rand R; Ris a primary alkyl group having about 1 to 10 carbon atoms, Ris a secondary alkyl group having about 3 to 10 carbon atoms, and Ris a tertiary alkyl group having about 3 to 10 carbon atoms; each Ris independently an alkyl group having about 1 to 10 carbon atoms; and a content of RSn(NR)(N(R)CHNR) is less than about 1 mol %. Methods for synthesizing, purifying, and storing these compounds are also provided. The monoalkyl tin compounds may be used for the formation of high-resolution EUV lithography patterning precursors and are attractive due to their high purity and minimal concentration of dialkyl tin and other tin impurities.
원문 (중국어)
Monoalkyl tin triamide compounds having purity of at least about 99 mol % and the chemical formula RSn(NMe)are described. Ris selected from R, Rand R; Ris a primary alkyl group having about 1 to 10 carbon atoms, Ris a secondary alkyl group having about 3 to 10 carbon atoms, and Ris a tertiary alkyl group having about 3 to 10 carbon atoms; each Ris independently an alkyl group having about 1 to 10 carbon atoms; and a content of RSn(NR)(N(R)CHNR) is less than about 1 mol %. Methods for synthesizing, purifying, and storing these compounds are also provided. The monoalkyl tin compounds may be used for the formation of high-resolution EUV lithography patterning precursors and are attractive due to their high purity and minimal concentration of dialkyl tin and other tin impurities.