Metallic Substrate Laser Treatment
Dossier Overview
Applicant
RTX Corporation
Inventor
Henry H. Thayer; Elaheh Fattahi Taghaddos; Hamidreza Mohseni; Seung-Yub Lee; David U. Furrer
IPC Classification
CPC Classification
A method for laser treating a substrate includes: deforming the substrate to place a portion of a first surface of the substrate in tensile stress; and while holding the substrate deformed, laser treating the portion. After the laser treating but before release of the deformation, the first surface may remain in tensile stress. Release of the deformation then at least partially cancels the tensile stress.
Original (Chinese)
A method for laser treating a substrate includes: deforming the substrate to place a portion of a first surface of the substrate in tensile stress; and while holding the substrate deformed, laser treating the portion. After the laser treating but before release of the deformation, the first surface may remain in tensile stress. Release of the deformation then at least partially cancels the tensile stress.
External Resources