RESIST COMPOSITION AND PATTERN FORMING PROCESS
Dossier Overview
Applicant
Shin-Etsu Chemical Co., Ltd.
Inventor
Yutaro Otomo; Takahiro Suzuki; Kazuhiro Katayama; Takeshi Sasami; Yoshihiro Tsuji; Tatsuya Suzuki
IPC Classification
CPC Classification
A resist composition comprising a base polymer comprising repeat units consisting of a carboxylic acid anion having iodine and a specific functional group, bonded to the backbone and an organic cation and repeat units consisting of a sulfonic acid anion bonded to the backbone and a sulfonium cation has a high sensitivity and a high contrast of alkaline dissolution rate before and after exposure. A pattern of satisfactory profile with reduced LWR and improved CDU is formed therefrom.
Original (Chinese)
A resist composition comprising a base polymer comprising repeat units consisting of a carboxylic acid anion having iodine and a specific functional group, bonded to the backbone and an organic cation and repeat units consisting of a sulfonic acid anion bonded to the backbone and a sulfonium cation has a high sensitivity and a high contrast of alkaline dissolution rate before and after exposure. A pattern of satisfactory profile with reduced LWR and improved CDU is formed therefrom.
External Resources