PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM
Dossier Overview
Applicant
TOKYO OHKA KOGYO CO., LTD.
Inventor
Tomotaka Yamada; Keiichi Ibata; Masaru Takeshita
IPC Classification
CPC Classification
A photosensitive composition having both etching resistance and good lithography properties, and capable of forming patterns with very small dimensions, and a method for producing a patterned cured film. The photosensitive composition includes a silicon-containing polymer including a phenolic hydroxy group, and an alkali-soluble group protected by an acid-dissociable group, and a photoacid generating agent, the photoacid generating agent including a photoacid generating agent having a sulfonium cation including an iodine atom.
Original (Chinese)
A photosensitive composition having both etching resistance and good lithography properties, and capable of forming patterns with very small dimensions, and a method for producing a patterned cured film. The photosensitive composition includes a silicon-containing polymer including a phenolic hydroxy group, and an alkali-soluble group protected by an acid-dissociable group, and a photoacid generating agent, the photoacid generating agent including a photoacid generating agent having a sulfonium cation including an iodine atom.
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