RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
Dossier Overview
Applicant
SAMSUNG SDI CO., LTD.
Inventor
Ran NAMGUNG; Hyeon PARK; Daeseok SONG; Kyoungjin HA; Minsoo KIM
IPC Classification
CPC Classification
Provided are a resist topcoat composition and a method of forming patterns using the resist topcoat composition, the resist topcoat composition including a polymer including a first structural unit and a second structural unit; and a solvent, wherein the first structural unit is represented by Chemical Formula M-1, and the second structural unit includes a metal element and is derived from a compound having an unsaturated double bond. Details of the Chemical Formulas are as described in the specification.
Original (Chinese)
Provided are a resist topcoat composition and a method of forming patterns using the resist topcoat composition, the resist topcoat composition including a polymer including a first structural unit and a second structural unit; and a solvent, wherein the first structural unit is represented by Chemical Formula M-1, and the second structural unit includes a metal element and is derived from a compound having an unsaturated double bond. Details of the Chemical Formulas are as described in the specification.
External Resources