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案件記録

MULTIGATE SEMICONDUCTOR DEVICES WITH VARIED THRESHOLD VOLTAGE CHARACTERISTICS

発明審査中
20請求項 · 3 独立
§ Ⅰ

案件概要

発明者

Akira Ito; Sim Loo

IPC分類

H1L 29/78H1L 29/6H1L 29/8

CPC分類

H10D30/6215H10D30/6211H10D30/65H10D62/116H10D62/155H10D62/159

An example multigate semiconductor device with varied threshold voltages includes a channel, a source disposed on the channel, a drain disposed on the channel, a first gate disposed on the channel between the source and the drain, and a second gate disposed on the channel between the first gate and the drain. The first gate includes a first metal and the second gate includes a second metal, the second metal being different from the first metal.

原文(中国語)

An example multigate semiconductor device with varied threshold voltages includes a channel, a source disposed on the channel, a drain disposed on the channel, a first gate disposed on the channel between the source and the drain, and a second gate disposed on the channel between the first gate and the drain. The first gate includes a first metal and the second gate includes a second metal, the second metal being different from the first metal.

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