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案件記録

Multigate Semiconductor Devices with Native Regions

発明審査中
1閲覧数
20請求項 · 3 独立
§ Ⅰ

案件概要

発明者

Sim Loo; Akira Ito

IPC分類

H10D 30/65H10D 30/62

CPC分類

H10D30/65H10D30/6215

An example multigate semiconductor device with varied threshold voltages includes a channel, a source disposed on the channel, a drain disposed on the channel, a first gate disposed on the channel between the source and the drain, a second gate disposed on the channel between the first gate and the drain, and/or a native region disposed below at least a portion of the channel. In some examples, the first gate comprises a first metal and the second gate comprises a second metal that is different from the first metal.

原文(中国語)

An example multigate semiconductor device with varied threshold voltages includes a channel, a source disposed on the channel, a drain disposed on the channel, a first gate disposed on the channel between the source and the drain, a second gate disposed on the channel between the first gate and the drain, and/or a native region disposed below at least a portion of the channel. In some examples, the first gate comprises a first metal and the second gate comprises a second metal that is different from the first metal.

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