化学机械抛光垫缓冲层、制备方法、抛光垫及应用
本发明提供一种化学机械抛光垫缓冲层、制备方法、抛光垫及应用,所述缓冲层包括聚氨酯层和支撑层,所述聚氨酯层由包含聚氨酯、阴离子型助剂、非离子型助剂和溶剂的浆料组合物固化而成。所述缓冲层的硬度为60‑80 Shore A、压缩比为4‑8%、密度为0.6‑0.8g/cm。本发明可提高抛光垫在抛光时的表面平坦度,改善缓冲层与抛光层的粘合性,进一步提高抛光垫的耐受性,减少抛光垫的鼓包问题。
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