一种纳米级粗糙度的保持环及其加工方法和应用
本发明提供一种纳米级粗糙度的保持环及其加工方法和应用。所述保持环包括金属环和塑料环,所述塑料环的表面粗糙度为0.01~0.8纳米。本申请提供的技术方案能够显著减低保持环的表面粗糙度,使其达到纳米级,从而使得该保持环在后续用于化学机械抛光的过程中,能够减小保持环与抛光垫之间的局部摩擦及异常磨损,降低颗粒脱落、晶圆划伤和边缘抛光不均的风险,提高化学机械抛光过程的稳定性以及晶圆表面加工质量。
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