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一种化学机械抛光系统
InventionUnknown
10Claims · 2 independent
§ Ⅰ
Dossier Overview
Inventor
许振杰; 王国栋; 王同庆
Filing Date
Dec 1, 2022
Publication Date
Oct 27, 2026
IPC Classification
B24B 37/10 (2012.01)B24B 27/00 (2006.01)B24B 37/34 (2012.01)B24B 55/06 (2006.01)H10P 52/40 (2026.01)
本发明公开了一种化学机械抛光系统，其包括：前置单元；抛光单元；以及清洗单元，设置于前置单元与抛光单元之间；所述抛光单元包括多个抛光模块和抛光传输机构，所述抛光模块围绕所述抛光传输机构设置；所述清洗单元包括多个后处理模块和清洗传输机构，所述后处理模块竖向层叠以形成层叠模组，所述层叠模组沿清洗单元的横向和纵向交错设置，所述清洗传输机构设置于所述层叠模组的侧部。
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