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GAS INJECTION SYSTEMS, REACTOR SYSTEMS INCLUDING GAS INJECTION SYSTEMS, AND METHODS FOR SUPPLYING A PROCESS GAS TO A REACTION CHAMBER

InventionPending
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20Claims · 3 independent
§ Ⅰ

Dossier Overview

Inventor

Chuwei Chen; Wentao Wang; Junwei Su; Alexandros Demos

IPC Classification

H1L 21/67

CPC Classification

H1L21/67069

Gas injection systems, reactor systems including gas injection systems, and methods for supplying a process gas to a reaction chamber are disclosed. The gas injection systems disclosed include gas source assemblies coupled to gas distribution assemblies in which an etchant gas and a precursor gas are combined prior to injection into a reaction chamber.

Original (Chinese)

Gas injection systems, reactor systems including gas injection systems, and methods for supplying a process gas to a reaction chamber are disclosed. The gas injection systems disclosed include gas source assemblies coupled to gas distribution assemblies in which an etchant gas and a precursor gas are combined prior to injection into a reaction chamber.

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