SEMICONDUCTOR MEMORY DEVICE HAVING STORAGE NODE CONTACT
Dossier Overview
Applicant
Samsung Electronics Co., Ltd.
Inventor
EUNJUNG KIM; HYO-SUB KIM; JAY-BOK CHOI; YONGSEOK AHN; JUNHYEOK AHN; KISEOK LEE; MYEONG-DONG LEE; YOONYOUNG CHOI
IPC Classification
CPC Classification
A semiconductor memory device includes a device isolation pattern defining first and second active sections, a first storage node pad on the first active section, a second storage node pad on the second active section, a word line extending across the first active section, a word-line capping pattern on the word line, a bit line crossing over the word line, a storage node contact on one side of the bit line and adjacent to the first storage node pad, and a pad separation pattern between the first and second storage node pads, wherein the storage node contact includes a contact metal pattern, and a contact diffusion barrier pattern surrounding a sidewall and a bottom surface of the contact metal pattern, wherein a bottom surface of the contact diffusion barrier pattern is rounded, and wherein the pad separation pattern contacts a top surface and a sidewall of the word-line capping pattern.
Original (Chinese)
A semiconductor memory device includes a device isolation pattern defining first and second active sections, a first storage node pad on the first active section, a second storage node pad on the second active section, a word line extending across the first active section, a word-line capping pattern on the word line, a bit line crossing over the word line, a storage node contact on one side of the bit line and adjacent to the first storage node pad, and a pad separation pattern between the first and second storage node pads, wherein the storage node contact includes a contact metal pattern, and a contact diffusion barrier pattern surrounding a sidewall and a bottom surface of the contact metal pattern, wherein a bottom surface of the contact diffusion barrier pattern is rounded, and wherein the pad separation pattern contacts a top surface and a sidewall of the word-line capping pattern.
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